The six atmospheric furnace systems located in the cleanroom facilities at Cidesi Queretaro provide basic oxidation and annealing capabilities needed for electron device fabrication on wafers up to 100 mm in diameter. Four furnaces are presently configured to allow either O2, 10% O2 + 90% N2, N2, or forming gas. Two extra furnaces are restricted to silicon-only processing and for silicon oxidation where the tube is connected to a steam generator for wet oxidation processes.
Atmospheric furnace systems
